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• W1602052125 endingPage "104407" @default.
• W1602052125 startingPage "104407" @default.
• W1602052125 abstract "A process based on reactive gas flow sputtering (GFS) for depositing visible-light active photocatalytic WO3 films at high deposition rates and with high film quality was successfully demonstrated. The deposition rate for this process was over 10 times higher than that achieved by the conventional sputtering process and the process was highly stable. Furthermore, Pt nanoparticle-loaded WO3 films deposited by the GFS process exhibited much higher photocatalytic activity than those deposited by conventional sputtering, where the photocatalytic activity was evaluated by the extent of decomposition of CH3CHO under visible light irradiation. The decomposition time for 60 ppm of CH3CHO was 7.5 times more rapid on the films deposited by the GFS process than on the films deposited by the conventional process. During GFS deposition, there are no high-energy particles bombarding the growing film surface, whereas the bombardment of the surface with high-energy particles is a key feature of conventional sputtering. Hence, the WO3 films deposited by GFS should be of higher quality, with fewer structural defects, which would lead to a decrease in the number of centers for electron-hole recombination and to the efficient use of photogenerated holes for the decomposition of CH3CHO." @default.
• W1602052125 created "2016-06-24" @default.
• W1602052125 creator A5000977568 @default.
• W1602052125 creator A5027991895 @default.
• W1602052125 creator A5031419998 @default.
• W1602052125 creator A5038646221 @default.
• W1602052125 creator A5039993889 @default.
• W1602052125 creator A5047985138 @default.
• W1602052125 creator A5063715165 @default.
• W1602052125 date "2015-10-01" @default.
• W1602052125 modified "2023-10-04" @default.
• W1602052125 title "Visible-light active thin-film WO₃ photocatalyst with controlled high-rate deposition by low-damage reactive-gas-flow sputtering" @default.
• W1602052125 cites W1624736721 @default.
• W1602052125 cites W1969991462 @default.
• W1602052125 cites W1973643322 @default.
• W1602052125 cites W1976615726 @default.
• W1602052125 cites W1980048478 @default.
• W1602052125 cites W1986175769 @default.
• W1602052125 cites W1986217407 @default.
• W1602052125 cites W1989826019 @default.
• W1602052125 cites W1989849393 @default.
• W1602052125 cites W2006123845 @default.
• W1602052125 cites W2013644890 @default.
• W1602052125 cites W2017746858 @default.
• W1602052125 cites W2022818130 @default.
• W1602052125 cites W2023248367 @default.
• W1602052125 cites W2025934000 @default.
• W1602052125 cites W2029609377 @default.
• W1602052125 cites W2030271267 @default.
• W1602052125 cites W2036135923 @default.
• W1602052125 cites W2045466170 @default.
• W1602052125 cites W2046786272 @default.
• W1602052125 cites W2049505009 @default.
• W1602052125 cites W2052283863 @default.
• W1602052125 cites W2060754365 @default.
• W1602052125 cites W2061436111 @default.
• W1602052125 cites W2072242419 @default.
• W1602052125 cites W2076257951 @default.
• W1602052125 cites W2083945292 @default.
• W1602052125 cites W2084771168 @default.
• W1602052125 cites W2089005658 @default.
• W1602052125 cites W2093604241 @default.
• W1602052125 cites W2118373239 @default.
• W1602052125 cites W2126940895 @default.
• W1602052125 cites W2129264675 @default.
• W1602052125 cites W2312535837 @default.
• W1602052125 cites W2331685732 @default.
• W1602052125 cites W2519271653 @default.
• W1602052125 cites W4239086666 @default.
• W1602052125 cites W4240268820 @default.
• W1602052125 cites W4243600016 @default.
• W1602052125 cites W4253698953 @default.
• W1602052125 doi "https://doi.org/10.1063/1.4922942" @default.
• W1602052125 hasPublicationYear "2015" @default.
• W1602052125 type Work @default.
• W1602052125 sameAs 1602052125 @default.
• W1602052125 citedByCount "20" @default.
• W1602052125 countsByYear W16020521252017 @default.
• W1602052125 countsByYear W16020521252019 @default.
• W1602052125 countsByYear W16020521252020 @default.
• W1602052125 countsByYear W16020521252021 @default.
• W1602052125 countsByYear W16020521252022 @default.
• W1602052125 countsByYear W16020521252023 @default.
• W1602052125 crossrefType "journal-article" @default.
• W1602052125 hasAuthorship W1602052125A5000977568 @default.
• W1602052125 hasAuthorship W1602052125A5027991895 @default.
• W1602052125 hasAuthorship W1602052125A5031419998 @default.
• W1602052125 hasAuthorship W1602052125A5038646221 @default.
• W1602052125 hasAuthorship W1602052125A5039993889 @default.
• W1602052125 hasAuthorship W1602052125A5047985138 @default.
• W1602052125 hasAuthorship W1602052125A5063715165 @default.
• W1602052125 hasBestOaLocation W16020521251 @default.
• W1602052125 hasConcept C104663316 @default.
• W1602052125 hasConcept C124681953 @default.
• W1602052125 hasConcept C127413603 @default.
• W1602052125 hasConcept C151730666 @default.
• W1602052125 hasConcept C155672457 @default.
• W1602052125 hasConcept C161790260 @default.
• W1602052125 hasConcept C171250308 @default.
• W1602052125 hasConcept C178790620 @default.
• W1602052125 hasConcept C185592680 @default.
• W1602052125 hasConcept C19067145 @default.
• W1602052125 hasConcept C192562407 @default.
• W1602052125 hasConcept C22423302 @default.
• W1602052125 hasConcept C2816523 @default.
• W1602052125 hasConcept C42360764 @default.
• W1602052125 hasConcept C49040817 @default.
• W1602052125 hasConcept C55493867 @default.
• W1602052125 hasConcept C61427134 @default.
• W1602052125 hasConcept C64297162 @default.
• W1602052125 hasConcept C65165184 @default.
• W1602052125 hasConcept C86803240 @default.
• W1602052125 hasConceptScore W1602052125C104663316 @default.
• W1602052125 hasConceptScore W1602052125C124681953 @default.
• W1602052125 hasConceptScore W1602052125C127413603 @default.
• W1602052125 hasConceptScore W1602052125C151730666 @default.
• W1602052125 hasConceptScore W1602052125C155672457 @default.
• W1602052125 hasConceptScore W1602052125C161790260 @default.

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