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• W1979936048 abstract "The Si L2,3-spectra of thin films of transition d-metal (TM) silicides (d-silicides) obtained by the ultrasoft X-ray emission spectroscopy (USXES) method have been analyzed on the basis of our d–s,p resonance model. Different stoichiometric composition silicides were obtained depending on the annealing conditions of heterostructures TM/Si mono TM/SiO2/Si mono. Compared with the spectra of the bulk samples, Si L2,3-spectra of thin film silicides demonstrate an increased intensity in the high energy range near the Fermi level. The unique sharp intensive peak of the Si s-state at the Fermi level is a consequence of the distinction of d–s resonance in NiSi2." @default.
• W1979936048 created "2016-06-24" @default.
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• W1979936048 date "1998-11-01" @default.
• W1979936048 modified "2023-09-27" @default.
• W1979936048 title "Specific features of electron structures of some thin film d-silicides" @default.
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• W1979936048 doi "https://doi.org/10.1016/s0368-2048(98)00236-9" @default.
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