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- W2050173231 abstract "N-channel polysilicon-gate FETs have been fabricated in a laser-melted silicon-on-SiO2-on-PLZT structure. Channel mobilities in the devices are 50cm2/Vs with threshold and source-to-drain breakdown voltages as expected from the dielectric thickness and channel doping used. PLZT wafers subjected to the same processing temperatures still show an excellent electro-optic effect." @default.
- W2050173231 created "2016-06-24" @default.
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- W2050173231 date "1987-01-01" @default.
- W2050173231 modified "2023-09-24" @default.
- W2050173231 title "Fabrication of polysilicon gate FET in laser melted silicon on silicon dioxide on PLZT" @default.
- W2050173231 cites W1991792434 @default.
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- W2050173231 doi "https://doi.org/10.1049/el:19870260" @default.
- W2050173231 hasPublicationYear "1987" @default.
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