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- W2060088013 abstract "In this work LPCVD silicon oxynitride films of various compositions between SiO 2 and Si 3 N 4 were deposited by changing the relative ratio (Ro) of nitrous oxide to silane pressures, and the ratio (Rl) of silone to ammonia pressures, while keeping constant the silane pressure. The silicon oxynitride films were deposited at 700°C on p-type silicon substrates (with a carrier concentration of 10 15 cm -3 ), varyng Ro from 0.5 to 2 and Rl from 2.5 to 10. The conduction characteristics of the silicon oxynitride films were studied by using current-voltage and capacitance-voltage measurements of MIS capacitors. Poole-Frenkel thermal emission is shown to be the dominant conduction mechanism in the films. In addition, it is shown that when the nitrous oxide to ammonia ratio increases from 1.25 to 20, i.e., as the oxygen concentration increases in the silicon oxynitride films, there seems to be an increase of charge compensation of the donors in the films." @default.
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- W2060088013 date "2001-08-20" @default.
- W2060088013 modified "2023-09-27" @default.
- W2060088013 title "POOLE-FRENKEL ELECTRICAL CONDUCTION IN SILICON OXYNITRIDE DEPOSITED BY LOW PRESSURE CHEMICAL VAPOUR DEPOSITION" @default.
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- W2060088013 doi "https://doi.org/10.1142/s0217984901002142" @default.
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