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- W2092045258 abstract "La2O3 films were prepared on (0001)-oriented GaN substrates via reactive molecular-beam epitaxy. Film orientation and phase were assessed using reflection high-energy electron and X-ray diffraction. Films were observed to grow as predominantly hexagonal La2O3 for thicknesses less than 10 nm while film thickness greater than 10 nm favored mixed cubic and hexagonal symmetries. Band offsets were characterized by X-ray photoelectron spectroscopy on hexagonally symmetric films and valence band offsets of 0.63 ± 0.04 eV at the La2O3/GaN interface were measured. A conduction band offset of approximately 1.5 eV could be inferred from the measured valence band offset." @default.
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- W2092045258 date "2013-04-22" @default.
- W2092045258 modified "2023-10-01" @default.
- W2092045258 title "Band offsets of La2O3 on (0001) GaN grown by reactive molecular-beam epitaxy" @default.
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- W2092045258 doi "https://doi.org/10.1063/1.4803091" @default.
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