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• W2341548328 abstract "We report the magnetic and optical properties of CuCr2O4 thin films fabricated by atomic layer deposition (ALD) from Cu(thd)2, Cr(acac)3, and ozone; we deposit 200 nm thick films and anneal them at 700 °C in oxygen atmosphere to crystallize the spinel phase. A ferrimagnetic transition at 140 K and a direct bandgap of 1.36 eV are determined for the films from magnetic and UV-vis spectrophotometric measurements. Electrical transport measurements confirm the p-type semiconducting behavior of the films. As the ALD technique allows the deposition of conformal pin-hole-free coatings on complex 3D surfaces, our CuCr2O4 films are interesting material candidates for various frontier applications." @default.
• W2341548328 created "2016-06-24" @default.
• W2341548328 creator A5033782513 @default.
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• W2341548328 date "2016-04-01" @default.
• W2341548328 modified "2023-10-18" @default.
• W2341548328 title "Transparent ferrimagnetic semiconducting CuCr₂O₄ thin films by atomic layer deposition" @default.
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• W2341548328 doi "https://doi.org/10.1063/1.4946884" @default.
• W2341548328 hasPublicationYear "2016" @default.
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