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• W2809907965 abstract "A novel high mobility channel material, amorphous tungsten doped indium-oxide, is used as the active layer of flexible TFT, which is fabricated on a transparent polyimide under a low temperature process. The effects of channel thickness are investigated as well in this work. The flexible TFT with a suitable thickness of IWO film shows a high carrier mobility and low sub-threshold swing. The improvement can be attributed to increased donor-like oxygen vacancy with the thickness of channel layer increased." @default.
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• W2809907965 date "2018-05-01" @default.
• W2809907965 modified "2023-09-25" @default.
• W2809907965 title "High mobility tungsten-doped thin-film transistor on polyimide substrate with low temperature process" @default.
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• W2809907965 doi "https://doi.org/10.1109/isne.2018.8394633" @default.
• W2809907965 hasPublicationYear "2018" @default.
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