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- W3036246263 abstract "Image processing and analysis provides a variety of powerful tools for characterizing morphological features of material microstructure including determination of object size and shape. Feature analysis of the rod structures present in Si-TaSi 2 semiconductor-metal eutectic composites has been important since any non-circularity or nonhomogeneous distribution of these rods can affect leakage currents in devices. In addition, device yield and reproducibility can be affected by nonuniformities in rod size, shape, and spacing in a given wafer. Determination of rod density variations in Si-TaSi 2 eutectic composites have been carried out using a scanning electron microscopy-image processing and analysis methodology. SEM data (Fig. 1) were collected using a JEOL 840 instrument (including computer-controlled x-y stage automation) coupled with a Tracor Northern 8502 high-performance image analyzer. Digital backscattered electron images were collected (512×512×8) since this imaging mode provided excellent contrast between the Ta-containing rods and the Si matrix. Gray-scale images were converted to binary images by suitable thresholding and then processed to determine the morphometries of interest. Programmed schedules allowed for computer acquisition of line profiles of data including control of specimen position. Typical line profiles across the widest portion of the wafer generally required 150-200 frames (at a magnification of 1000×) and occupied the instrument for ≈3 h." @default.
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- W3036246263 date "1990-08-12" @default.
- W3036246263 modified "2023-09-26" @default.
- W3036246263 title "Image Analysis-Based Microstructural Characterization of Eutectic Silicide Composites" @default.
- W3036246263 doi "https://doi.org/10.1017/s0424820100181488" @default.
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