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• W2052238045 abstract "Lithography is a key process in fabrication of semiconductors, especially, it plays the main role in the size of integrated circuit. Because of the diffraction limit, the size of lithography image cannot be shrunk less than wavelength. In this paper, we offer a practical method to get a subwavelength image by using visible light. This method is based on the localized surface plasmon among silver nanorods, if the conditions of the polarization of light and configuration of the nanorod mask are optimized." @default.
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• W2052238045 date "2010-05-01" @default.
• W2052238045 modified "2023-09-27" @default.
• W2052238045 title "Lithography mask made by silver nanorods" @default.
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• W2052238045 doi "https://doi.org/10.1109/3ca.2010.5533391" @default.
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