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• W2074417336 abstract "Plasma-assisted electron-beam evaporation leads to changes in the crystallinity, density, and stresses of thin films. A dual-source plasma system provides stress control of large-aperture, high-fluence coatings used in vacuum for substrates 1 m in aperture." @default.
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• W2074417336 date "2010-01-01" @default.
• W2074417336 modified "2023-09-24" @default.
• W2074417336 title "Large-Aperture Plasma-Assisted Deposition of ICF Laser Coatings" @default.
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• W2074417336 doi "https://doi.org/10.1364/oic.2010.mb7" @default.
• W2074417336 hasPublicationYear "2010" @default.
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