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• W2767656415 abstract "A scalable and a fully solution‐based method is developed to produce environmentally stable Ag micro/nanowire networks for transparent conductors. By applying a self‐cracking, water‐soluble acrylate copolymer film as a photoresist mask, the need for formal photomask fabrication and costly vacuum and lithographic facilities is obviated. Also, an increase in adhesion and a decrease in roughness of the metal networks is demonstrated by depositing metal into the regions created by the glass etch step. As a result, the networks can potentially be inexpensively scaled to large areas, as well as be flexible after removal from the substrate. They also exhibit record values of figures of merit that have been employed in the literature, offering a possibly excellent replacement for ITO." @default.
• W2767656415 created "2017-11-17" @default.
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• W2767656415 date "2017-11-07" @default.
• W2767656415 modified "2023-10-14" @default.
• W2767656415 title "All-Solution-Processed, Scalable, Self-Cracking Ag Network Transparent Conductor" @default.
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• W2767656415 doi "https://doi.org/10.1002/pssa.201700504" @default.
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