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- C2986596850 created "2019-11-22" @default.
- C2986596850 modified "2023-10-18" @default.
- C2986596850 type Concept @default.
- C2986596850 seeAlso "https://en.wikipedia.org/wiki/Chemical%20vapor%20deposition" @default.
- C2986596850 sameAs Q505668 @default.
- C2986596850 sameAs 2986596850 @default.
- C2986596850 broader C121332964 @default.
- C2986596850 broader C159985019 @default.
- C2986596850 broader C171250308 @default.
- C2986596850 broader C178790620 @default.
- C2986596850 broader C185592680 @default.
- C2986596850 broader C19067145 @default.
- C2986596850 broader C192562407 @default.
- C2986596850 broader C2781448156 @default.
- C2986596850 broader C62520636 @default.
- C2986596850 inScheme concepts @default.
- C2986596850 note "chemical process used in the semiconductor industry to produce thin films" @default.
- C2986596850 prefLabel "Vapour deposition" @default.
- C2986596850 depiction "https://upload.wikimedia.org/wikipedia/commons/b/b1/PICT0111.JPG" @default.
- C2986596850 citedByCount "11008" @default.
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- C2986596850 countsByYear C29865968502016 @default.
- C2986596850 countsByYear C29865968502017 @default.
- C2986596850 countsByYear C29865968502018 @default.
- C2986596850 countsByYear C29865968502019 @default.
- C2986596850 countsByYear C29865968502020 @default.
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- C2986596850 countsByYear C29865968502022 @default.
- C2986596850 countsByYear C29865968502023 @default.
- C2986596850 imageThumbnail "https://upload.wikimedia.org/wikipedia/commons/thumb/b/b1/PICT0111.JPG/75px-PICT0111.JPG" @default.
- C2986596850 level "3" @default.
- C2986596850 magId "2986596850" @default.
- C2986596850 worksCount "982" @default.
