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- S4306522466 created "2022-10-17" @default.
- S4306522466 modified "2023-10-11" @default.
- S4306522466 h-index "6" @default.
- S4306522466 type Source @default.
- S4306522466 name "Photomask and next-generation lithography mask technology. Conference" @default.
- S4306522466 2YrMeanCitedness "0" @default.
- S4306522466 citedByCount "2" @default.
- S4306522466 i10Index "2" @default.
- S4306522466 isInDoaj "false" @default.
- S4306522466 isOa "false" @default.
- S4306522466 sourceType "conference" @default.
- S4306522466 worksCount "2" @default.