Matches in SemOpenAlex for { <https://semopenalex.org/work/W436658002> ?p ?o ?g. }
Showing items 1 to 36 of
36
with 100 items per page.
- W436658002 endingPage "18" @default.
- W436658002 startingPage "13" @default.
- W436658002 created "2016-06-24" @default.
- W436658002 creator A5012296179 @default.
- W436658002 creator A5030100231 @default.
- W436658002 creator A5069120888 @default.
- W436658002 creator A5076614413 @default.
- W436658002 creator A5088007017 @default.
- W436658002 date "1995-09-30" @default.
- W436658002 modified "2023-09-23" @default.
- W436658002 title "SiH_2Cl_2 をソースガスとしたプラズマCVD法による SiC 薄膜の生成と諸特性" @default.
- W436658002 hasPublicationYear "1995" @default.
- W436658002 type Work @default.
- W436658002 sameAs 436658002 @default.
- W436658002 citedByCount "0" @default.
- W436658002 crossrefType "proceedings-article" @default.
- W436658002 hasAuthorship W436658002A5012296179 @default.
- W436658002 hasAuthorship W436658002A5030100231 @default.
- W436658002 hasAuthorship W436658002A5069120888 @default.
- W436658002 hasAuthorship W436658002A5076614413 @default.
- W436658002 hasAuthorship W436658002A5088007017 @default.
- W436658002 hasConcept C159985019 @default.
- W436658002 hasConcept C192562407 @default.
- W436658002 hasConcept C49040817 @default.
- W436658002 hasConceptScore W436658002C159985019 @default.
- W436658002 hasConceptScore W436658002C192562407 @default.
- W436658002 hasConceptScore W436658002C49040817 @default.
- W436658002 hasIssue "284" @default.
- W436658002 hasLocation W4366580021 @default.
- W436658002 hasOpenAccess W436658002 @default.
- W436658002 hasPrimaryLocation W4366580021 @default.
- W436658002 hasVolume "95" @default.
- W436658002 isParatext "false" @default.
- W436658002 isRetracted "false" @default.
- W436658002 magId "436658002" @default.
- W436658002 workType "article" @default.