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Q52590896 description "2018 nî lūn-bûn" @default.
Q52590896 description "2018 թվականի ապրիլի 12-ին հրատարակված գիտական հոդված" @default.
Q52590896 description "2018年の論文" @default.
Q52590896 description "2018年学术文章" @default.
Q52590896 description "2018年学术文章" @default.
Q52590896 description "2018年学术文章" @default.
Q52590896 description "2018年学术文章" @default.
Q52590896 description "2018年学术文章" @default.
Q52590896 description "2018年学术文章" @default.
Q52590896 description "2018年學術文章" @default.
Q52590896 description "2018年學術文章" @default.
Q52590896 description "2018年學術文章" @default.
Q52590896 description "2018年學術文章" @default.
Q52590896 description "2018年學術文章" @default.
Q52590896 description "2018년 논문" @default.
Q52590896 description "article científic" @default.
Q52590896 description "article scientific" @default.
Q52590896 description "article scientifique" @default.
Q52590896 description "articol științific" @default.
Q52590896 description "articolo scientifico" @default.
Q52590896 description "artigo científico" @default.
Q52590896 description "artigo científico" @default.
Q52590896 description "artigo científico" @default.
Q52590896 description "artikel ilmiah" @default.
Q52590896 description "artikull shkencor" @default.
Q52590896 description "artikulong pang-agham" @default.
Q52590896 description "artykuł naukowy" @default.
Q52590896 description "artículo científico publicado en 2018" @default.
Q52590896 description "artículu científicu" @default.
Q52590896 description "bilimsel makale" @default.
Q52590896 description "bài báo khoa học" @default.
Q52590896 description "naučni članak" @default.
Q52590896 description "scienca artikolo" @default.
Q52590896 description "scientific article published on 12 April 2018" @default.
Q52590896 description "scientific article published on 12 April 2018" @default.
Q52590896 description "scientific article published on 12 April 2018" @default.
Q52590896 description "teaduslik artikkel" @default.
Q52590896 description "tieteellinen artikkeli" @default.
Q52590896 description "tudományos cikk" @default.
Q52590896 description "vedecký článok" @default.
Q52590896 description "vetenskaplig artikel" @default.
Q52590896 description "videnskabelig artikel" @default.
Q52590896 description "vitenskapelig artikkel" @default.
Q52590896 description "vitskapeleg artikkel" @default.
Q52590896 description "vědecký článek" @default.
Q52590896 description "wetenschappelijk artikel" @default.
Q52590896 description "wissenschaftlicher Artikel" @default.
Q52590896 description "επιστημονικό άρθρο" @default.
Q52590896 description "мақолаи илмӣ" @default.
Q52590896 description "наукова стаття, опублікована у квітні 2018" @default.
Q52590896 description "научна статия" @default.
Q52590896 description "научная статья" @default.
Q52590896 description "научни чланак" @default.
Q52590896 description "научни чланак" @default.
Q52590896 description "מאמר מדעי" @default.
Q52590896 description "مقالة علمية نشرت في 12 أبريل 2018" @default.
Q52590896 description "১২ এপ্রিল ২০১৮-এ প্রকাশিত বৈজ্ঞানিক নিবন্ধ" @default.
Q52590896 description "บทความทางวิทยาศาสตร์" @default.
Q52590896 description "სამეცნიერო სტატია" @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 name "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 type Item @default.
Q52590896 label "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 label "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 label "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 label "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 label "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 label "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 label "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 label "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 label "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 label "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.
Q52590896 label "Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide." @default.