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- Q56489862 description "im August 2011 veröffentlichter wissenschaftlicher Artikel" @default.
- Q56489862 description "wetenschappelijk artikel" @default.
- Q56489862 description "наукова стаття, опублікована в серпні 2011" @default.
- Q56489862 name "Nanomechanical properties of sputter-deposited HfO2 and HfxSi1-xO2 thin films" @default.
- Q56489862 name "Nanomechanical properties of sputter-deposited HfO2 and HfxSi1-xO2 thin films" @default.
- Q56489862 type Item @default.
- Q56489862 label "Nanomechanical properties of sputter-deposited HfO2 and HfxSi1-xO2 thin films" @default.
- Q56489862 label "Nanomechanical properties of sputter-deposited HfO2 and HfxSi1-xO2 thin films" @default.
- Q56489862 prefLabel "Nanomechanical properties of sputter-deposited HfO2 and HfxSi1-xO2 thin films" @default.
- Q56489862 prefLabel "Nanomechanical properties of sputter-deposited HfO2 and HfxSi1-xO2 thin films" @default.
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- Q56489862 P31 Q56489862-A36DBDB8-9AD6-4DE0-A90F-894DBC4518F1 @default.
- Q56489862 P356 Q56489862-9F5E5FA7-E24F-4064-A28B-67E4BB9050F8 @default.
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- Q56489862 P921 Q56489862-EDFADC2C-7280-4E67-88C1-99576F2CC510 @default.
- Q56489862 P356 1.3627155 @default.
- Q56489862 P1433 Q1987941 @default.
- Q56489862 P1476 "Nanomechanical properties of sputter-deposited HfO2 and HfxSi1-xO2 thin films" @default.
- Q56489862 P2093 "D. K. Venkatachalam" @default.
- Q56489862 P2093 "J. E. Bradby" @default.
- Q56489862 P2093 "M. N. Saleh" @default.
- Q56489862 P2093 "R. G. Elliman" @default.
- Q56489862 P2093 "S. Ruffell" @default.
- Q56489862 P2860 Q56829414 @default.
- Q56489862 P2860 Q58016863 @default.
- Q56489862 P304 "043527" @default.
- Q56489862 P31 Q13442814 @default.
- Q56489862 P356 "10.1063/1.3627155" @default.
- Q56489862 P433 "4" @default.
- Q56489862 P478 "110" @default.
- Q56489862 P577 "2011-08-15T00:00:00Z" @default.
- Q56489862 P921 Q1137203 @default.