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- Q57696967 description "article scientifique publié en 1995" @default.
- Q57696967 description "wetenschappelijk artikel" @default.
- Q57696967 description "наукова стаття, опублікована в березні 1995" @default.
- Q57696967 name "Thermodynamic analysis of metalorganic chemical vapour deposition of SiC using tetramethylsilane as precursor. I. Identification of the main reactions" @default.
- Q57696967 name "Thermodynamic analysis of metalorganic chemical vapour deposition of SiC using tetramethylsilane as precursor. I. Identification of the main reactions" @default.
- Q57696967 type Item @default.
- Q57696967 label "Thermodynamic analysis of metalorganic chemical vapour deposition of SiC using tetramethylsilane as precursor. I. Identification of the main reactions" @default.
- Q57696967 label "Thermodynamic analysis of metalorganic chemical vapour deposition of SiC using tetramethylsilane as precursor. I. Identification of the main reactions" @default.
- Q57696967 prefLabel "Thermodynamic analysis of metalorganic chemical vapour deposition of SiC using tetramethylsilane as precursor. I. Identification of the main reactions" @default.
- Q57696967 prefLabel "Thermodynamic analysis of metalorganic chemical vapour deposition of SiC using tetramethylsilane as precursor. I. Identification of the main reactions" @default.
- Q57696967 P1433 Q57696967-5EB63C8B-E415-431B-9D21-3BF463D168E4 @default.
- Q57696967 P1476 Q57696967-6FDF7AAC-DF22-43AB-BA1E-D2DB09B8C22E @default.
- Q57696967 P2093 Q57696967-8DC5D10D-5A7F-488E-BBA6-9AA5CE9E5BA4 @default.
- Q57696967 P2093 Q57696967-B1880B9A-7E82-4B67-A35C-40328785CD45 @default.
- Q57696967 P2093 Q57696967-C5F28BC6-9B9A-4E76-AEF8-2BB0BE436A63 @default.
- Q57696967 P2093 Q57696967-EB0DDC81-F6A6-43C7-B102-A0709C863696 @default.
- Q57696967 P304 Q57696967-F6835D04-5FE6-4CBB-81DF-06B6C7264B51 @default.
- Q57696967 P31 Q57696967-1F481100-97F0-4079-83EC-73C19BE80034 @default.
- Q57696967 P356 Q57696967-B52D7FD7-62EF-4029-8E5C-C3BC970F89B3 @default.
- Q57696967 P433 Q57696967-38FCAB9E-549A-430C-ABBF-7C620C0D8773 @default.
- Q57696967 P478 Q57696967-1B09CD8F-8827-4FB5-9401-3DBDBE4F12C5 @default.
- Q57696967 P577 Q57696967-A2B9CB68-22DD-4838-BA0D-1F7F970ADD8E @default.
- Q57696967 P356 0022-0248(94)00645-8 @default.
- Q57696967 P1433 Q1929756 @default.
- Q57696967 P1476 "Thermodynamic analysis of metalorganic chemical vapour deposition of SiC using tetramethylsilane as precursor. I. Identification of the main reactions" @default.
- Q57696967 P2093 "A. Figueras" @default.
- Q57696967 P2093 "R. Rodríguez-Clemente" @default.
- Q57696967 P2093 "S. Veintemillas" @default.
- Q57696967 P2093 "V. Madigou" @default.
- Q57696967 P304 "383-389" @default.
- Q57696967 P31 Q13442814 @default.
- Q57696967 P356 "10.1016/0022-0248(94)00645-8" @default.
- Q57696967 P433 "4" @default.
- Q57696967 P478 "148" @default.
- Q57696967 P577 "1995-03-01T00:00:00Z" @default.