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- Q58290010 description "article scientifique publié en 2017" @default.
- Q58290010 description "scholarly article by Jae-Hyung Park et al published October 2017 in Journal of Alloys and Compounds" @default.
- Q58290010 description "wetenschappelijk artikel" @default.
- Q58290010 description "наукова стаття, опублікована в жовтні 2017" @default.
- Q58290010 name "Investigation of the barrier properties of copper-vanadium alloys with a sub-tantalum layer on low-k dielectrics" @default.
- Q58290010 name "Investigation of the barrier properties of copper-vanadium alloys with a sub-tantalum layer on low-k dielectrics" @default.
- Q58290010 type Item @default.
- Q58290010 label "Investigation of the barrier properties of copper-vanadium alloys with a sub-tantalum layer on low-k dielectrics" @default.
- Q58290010 label "Investigation of the barrier properties of copper-vanadium alloys with a sub-tantalum layer on low-k dielectrics" @default.
- Q58290010 prefLabel "Investigation of the barrier properties of copper-vanadium alloys with a sub-tantalum layer on low-k dielectrics" @default.
- Q58290010 prefLabel "Investigation of the barrier properties of copper-vanadium alloys with a sub-tantalum layer on low-k dielectrics" @default.
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- Q58290010 P1476 Q58290010-4AA2CFD0-F2D3-4CB0-96B4-BBA9F88C44D9 @default.
- Q58290010 P2093 Q58290010-4E263F82-62F8-49B3-ABF1-E8B5296EEFA6 @default.
- Q58290010 P2093 Q58290010-C04036A1-84FA-44BA-9CBB-C03F39053799 @default.
- Q58290010 P2093 Q58290010-D33E525C-1ADE-4A31-992B-C938F32B7C9B @default.
- Q58290010 P2093 Q58290010-E4A8EEC0-F804-43A4-9DC5-1CF4AB5A8ACE @default.
- Q58290010 P304 Q58290010-009BEBB7-A8B3-4CDF-A976-BEB66A7A09A4 @default.
- Q58290010 P31 Q58290010-C73B3488-82FB-4734-8A70-AA633A30AB55 @default.
- Q58290010 P356 Q58290010-3EE6A64C-2A47-4F4F-A099-33F0D04F288B @default.
- Q58290010 P478 Q58290010-C0C479F3-4DAE-43F5-AA7E-FCC55E0D8F8E @default.
- Q58290010 P577 Q58290010-526D01BB-2611-46F1-92A2-84E1CB40417F @default.
- Q58290010 P921 Q58290010-7381B5ED-FFD2-4DFE-B27A-55090CB47DA6 @default.
- Q58290010 P356 J.JALLCOM.2017.06.103 @default.
- Q58290010 P1433 Q4306918 @default.
- Q58290010 P1476 "Investigation of the barrier properties of copper-vanadium alloys with a sub-tantalum layer on low-k dielectrics" @default.
- Q58290010 P2093 "Hyeong-Tag Jeon" @default.
- Q58290010 P2093 "Jae-Hyung Park" @default.
- Q58290010 P2093 "Jong-Wan Park" @default.
- Q58290010 P2093 "Kyoung-Deok Kim" @default.
- Q58290010 P304 "259-264" @default.
- Q58290010 P31 Q13442814 @default.
- Q58290010 P356 "10.1016/J.JALLCOM.2017.06.103" @default.
- Q58290010 P478 "722" @default.
- Q58290010 P577 "2017-10-01T00:00:00Z" @default.
- Q58290010 P921 Q1123 @default.