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- Q58431660 description "article scientifique publié en 2001" @default.
- Q58431660 description "scholarly article by R. Martins et al published December 2001 in Applied Surface Science" @default.
- Q58431660 description "wetenschappelijk artikel" @default.
- Q58431660 description "наукова стаття, опублікована в грудні 2001" @default.
- Q58431660 name "Correlation between the carbon and hydrogen contents with the gas species and the plasma impedance of silicon carbide films produced by PECVD technique" @default.
- Q58431660 name "Correlation between the carbon and hydrogen contents with the gas species and the plasma impedance of silicon carbide films produced by PECVD technique" @default.
- Q58431660 type Item @default.
- Q58431660 label "Correlation between the carbon and hydrogen contents with the gas species and the plasma impedance of silicon carbide films produced by PECVD technique" @default.
- Q58431660 label "Correlation between the carbon and hydrogen contents with the gas species and the plasma impedance of silicon carbide films produced by PECVD technique" @default.
- Q58431660 prefLabel "Correlation between the carbon and hydrogen contents with the gas species and the plasma impedance of silicon carbide films produced by PECVD technique" @default.
- Q58431660 prefLabel "Correlation between the carbon and hydrogen contents with the gas species and the plasma impedance of silicon carbide films produced by PECVD technique" @default.
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- Q58431660 P1476 Q58431660-4531797A-CC81-4319-B947-B1A91319D0EA @default.
- Q58431660 P2093 Q58431660-479EFA69-DC4D-4521-AD70-E96FA48E0052 @default.
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- Q58431660 P304 Q58431660-C8AF463A-E1FD-4380-9BB7-CF2D6B721A9F @default.
- Q58431660 P31 Q58431660-D4D7B8B7-64CC-4811-BE79-8550CE194E78 @default.
- Q58431660 P356 Q58431660-3BECA65E-3B88-459D-AB98-96B7D91B080D @default.
- Q58431660 P433 Q58431660-99E40E89-8827-46E5-83F8-CFD08A369D07 @default.
- Q58431660 P478 Q58431660-9BFB49E1-8E00-425F-8EC6-731085AED4CF @default.
- Q58431660 P50 Q58431660-487782AF-595F-4EFC-B074-34A863856726 @default.
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- Q58431660 P50 Q58431660-D2C957C6-748E-4A65-A2C1-72B56EE19CAC @default.
- Q58431660 P577 Q58431660-D7014987-6CEE-4908-8EEB-EF6E3C9845CA @default.
- Q58431660 P921 Q58431660-A4AD6716-0FC0-492C-A314-CB58FE9539F9 @default.
- Q58431660 P356 S0169-4332(01)00483-4 @default.
- Q58431660 P1433 Q2772524 @default.
- Q58431660 P1476 "Correlation between the carbon and hydrogen contents with the gas species and the plasma impedance of silicon carbide films produced by PECVD technique" @default.
- Q58431660 P2093 "A. Cabrita" @default.
- Q58431660 P2093 "R. Martins" @default.
- Q58431660 P2093 "V. Silva" @default.
- Q58431660 P304 "101-106" @default.
- Q58431660 P31 Q13442814 @default.
- Q58431660 P356 "10.1016/S0169-4332(01)00483-4" @default.
- Q58431660 P433 "1-4" @default.
- Q58431660 P478 "184" @default.
- Q58431660 P50 Q10272093 @default.
- Q58431660 P50 Q57464610 @default.
- Q58431660 P50 Q57948542 @default.
- Q58431660 P577 "2001-12-01T00:00:00Z" @default.
- Q58431660 P921 Q412356 @default.