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- Q58886005 description "wetenschappelijk artikel" @default.
- Q58886005 description "наукова стаття, опублікована в травні 2014" @default.
- Q58886005 name "Atomic layer deposition of HfO2 thin films using H2O2 as oxidant" @default.
- Q58886005 name "Atomic layer deposition of HfO2 thin films using H2O2 as oxidant" @default.
- Q58886005 type Item @default.
- Q58886005 label "Atomic layer deposition of HfO2 thin films using H2O2 as oxidant" @default.
- Q58886005 label "Atomic layer deposition of HfO2 thin films using H2O2 as oxidant" @default.
- Q58886005 prefLabel "Atomic layer deposition of HfO2 thin films using H2O2 as oxidant" @default.
- Q58886005 prefLabel "Atomic layer deposition of HfO2 thin films using H2O2 as oxidant" @default.
- Q58886005 P1433 Q58886005-A0A271ED-E145-4889-8528-D9E5192EA719 @default.
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- Q58886005 P2093 Q58886005-FF3D9BC5-9018-4073-9A42-2C2936ACEF86 @default.
- Q58886005 P304 Q58886005-843E662A-5F9A-4A1B-889E-AA28EC2C80CC @default.
- Q58886005 P31 Q58886005-713EA512-3997-4A98-8663-F9D60111910C @default.
- Q58886005 P356 Q58886005-2F5896F6-75DD-4640-A43C-1E6E325BD081 @default.
- Q58886005 P478 Q58886005-6C77D0FF-4AAB-4618-A30C-FAD42C6335B6 @default.
- Q58886005 P50 Q58886005-4019F5A2-2309-4302-9E4C-BFBAADDBAAEC @default.
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- Q58886005 P921 Q58886005-71547945-E386-4F87-ADF1-4DA5821339C3 @default.
- Q58886005 P356 J.APSUSC.2014.02.098 @default.
- Q58886005 P1433 Q2772524 @default.
- Q58886005 P1476 "Atomic layer deposition of HfO2 thin films using H2O2 as oxidant" @default.
- Q58886005 P2093 "Doo Seok Jeong" @default.
- Q58886005 P2093 "Hyung-Ho Park" @default.
- Q58886005 P2093 "Jeong Hwan Kim" @default.
- Q58886005 P2093 "Jin-Sang Kim" @default.
- Q58886005 P2093 "Min-Jung Choi" @default.
- Q58886005 P304 "451-455" @default.
- Q58886005 P31 Q13442814 @default.
- Q58886005 P356 "10.1016/J.APSUSC.2014.02.098" @default.
- Q58886005 P478 "301" @default.
- Q58886005 P50 Q50650729 @default.
- Q58886005 P577 "2014-05-01T00:00:00Z" @default.
- Q58886005 P921 Q1137203 @default.