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- Q61625885 description "article scientifique publié en 1998" @default.
- Q61625885 description "im November 1998 veröffentlichter wissenschaftlicher Artikel" @default.
- Q61625885 description "wetenschappelijk artikel" @default.
- Q61625885 description "наукова стаття, опублікована в листопаді 1998" @default.
- Q61625885 name "Comparative study of AZPN114 and SAL601 chemically amplified resists for electron beam nanolithography" @default.
- Q61625885 name "Comparative study of AZPN114 and SAL601 chemically amplified resists for electron beam nanolithography" @default.
- Q61625885 type Item @default.
- Q61625885 label "Comparative study of AZPN114 and SAL601 chemically amplified resists for electron beam nanolithography" @default.
- Q61625885 label "Comparative study of AZPN114 and SAL601 chemically amplified resists for electron beam nanolithography" @default.
- Q61625885 prefLabel "Comparative study of AZPN114 and SAL601 chemically amplified resists for electron beam nanolithography" @default.
- Q61625885 prefLabel "Comparative study of AZPN114 and SAL601 chemically amplified resists for electron beam nanolithography" @default.
- Q61625885 P1433 Q61625885-3805BA87-4668-4DAD-91BA-66A1B6FF37DF @default.
- Q61625885 P1476 Q61625885-ECEC9202-0D26-485E-938F-0020211307AD @default.
- Q61625885 P2093 Q61625885-7AE0270F-BB0D-42ED-96C8-2F52BA02F325 @default.
- Q61625885 P304 Q61625885-07ABFA82-E977-4177-BFA4-54B18574FCB3 @default.
- Q61625885 P31 Q61625885-FE7B7955-53E6-4F20-94A3-D63730C29ED0 @default.
- Q61625885 P356 Q61625885-62FE005C-8319-4E53-94FD-48C9F8649F6F @default.
- Q61625885 P433 Q61625885-8167B219-196E-413D-AC84-BF1BF405AED8 @default.
- Q61625885 P478 Q61625885-4D62ED42-0958-4B7F-B9E9-653F1C02C7BD @default.
- Q61625885 P50 Q61625885-51B46837-1330-4453-8F6B-2738739E0E00 @default.
- Q61625885 P577 Q61625885-D196B13C-9A05-4BDE-81E8-EE64CFB6BD2A @default.
- Q61625885 P356 1.590365 @default.
- Q61625885 P1433 Q29043658 @default.
- Q61625885 P1476 "Comparative study of AZPN114 and SAL601 chemically amplified resists for electron beam nanolithography" @default.
- Q61625885 P2093 "Zheng Cui" @default.
- Q61625885 P304 "3284" @default.
- Q61625885 P31 Q13442814 @default.
- Q61625885 P356 "10.1116/1.590365" @default.
- Q61625885 P433 "6" @default.
- Q61625885 P478 "16" @default.
- Q61625885 P50 Q56155346 @default.
- Q61625885 P577 "1998-11-01T00:00:00Z" @default.