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- Q62675478 description "article" @default.
- Q62675478 description "im Januar 2014 veröffentlichter wissenschaftlicher Artikel" @default.
- Q62675478 description "wetenschappelijk artikel" @default.
- Q62675478 description "наукова стаття, опублікована в січні 2014" @default.
- Q62675478 name "Direct observation of bias-dependence potential distribution in metal/HfO2 gate stack structures by hard x-ray photoelectron spectroscopy under device operation" @default.
- Q62675478 name "Direct observation of bias-dependence potential distribution in metal/HfO2 gate stack structures by hard x-ray photoelectron spectroscopy under device operation" @default.
- Q62675478 type Item @default.
- Q62675478 label "Direct observation of bias-dependence potential distribution in metal/HfO2 gate stack structures by hard x-ray photoelectron spectroscopy under device operation" @default.
- Q62675478 label "Direct observation of bias-dependence potential distribution in metal/HfO2 gate stack structures by hard x-ray photoelectron spectroscopy under device operation" @default.
- Q62675478 prefLabel "Direct observation of bias-dependence potential distribution in metal/HfO2 gate stack structures by hard x-ray photoelectron spectroscopy under device operation" @default.
- Q62675478 prefLabel "Direct observation of bias-dependence potential distribution in metal/HfO2 gate stack structures by hard x-ray photoelectron spectroscopy under device operation" @default.
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- Q62675478 P304 Q62675478-9AE9AD34-1CF3-44B9-AAFF-F5881A28F082 @default.
- Q62675478 P31 Q62675478-10EEAA43-F77D-49B7-AD53-73FB8C21F88F @default.
- Q62675478 P356 Q62675478-136B8F05-8FA2-4394-9DBC-16736A47F534 @default.
- Q62675478 P433 Q62675478-C349F75B-1914-452C-B1F1-C858CA6A15A6 @default.
- Q62675478 P478 Q62675478-9F569EB2-C1E4-4291-A4C4-DEF1E69ED9A0 @default.
- Q62675478 P577 Q62675478-22D73348-5610-458A-813F-6BBE7C86574C @default.
- Q62675478 P356 1.4863637 @default.
- Q62675478 P1433 Q1987941 @default.
- Q62675478 P1476 "Direct observation of bias-dependence potential distribution in metal/HfO2 gate stack structures by hard x-ray photoelectron spectroscopy under device operation" @default.
- Q62675478 P2093 "H. Yoshikawa" @default.
- Q62675478 P2093 "K. Kobayashi" @default.
- Q62675478 P2093 "T. Chikyo" @default.
- Q62675478 P2093 "Y. Yamashita" @default.
- Q62675478 P304 "043721" @default.
- Q62675478 P31 Q13442814 @default.
- Q62675478 P356 "10.1063/1.4863637" @default.
- Q62675478 P433 "4" @default.
- Q62675478 P478 "115" @default.
- Q62675478 P577 "2014-01-28T00:00:00Z" @default.