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- Q63381646 description "article scientifique publié en 2005" @default.
- Q63381646 description "im Oktober 2005 veröffentlichter wissenschaftlicher Artikel" @default.
- Q63381646 description "wetenschappelijk artikel" @default.
- Q63381646 description "наукова стаття, опублікована в жовтні 2005" @default.
- Q63381646 name "Comment on “Radiative and nonradiative recombination process in InN films grown by metal organic chemical vapor deposition” [Appl. Phys. Lett. 86, 142104 (2005)]" @default.
- Q63381646 name "Comment on “Radiative and nonradiative recombination process in InN films grown by metal organic chemical vapor deposition” [Appl. Phys. Lett. 86, 142104 (2005)]" @default.
- Q63381646 type Item @default.
- Q63381646 label "Comment on “Radiative and nonradiative recombination process in InN films grown by metal organic chemical vapor deposition” [Appl. Phys. Lett. 86, 142104 (2005)]" @default.
- Q63381646 label "Comment on “Radiative and nonradiative recombination process in InN films grown by metal organic chemical vapor deposition” [Appl. Phys. Lett. 86, 142104 (2005)]" @default.
- Q63381646 prefLabel "Comment on “Radiative and nonradiative recombination process in InN films grown by metal organic chemical vapor deposition” [Appl. Phys. Lett. 86, 142104 (2005)]" @default.
- Q63381646 prefLabel "Comment on “Radiative and nonradiative recombination process in InN films grown by metal organic chemical vapor deposition” [Appl. Phys. Lett. 86, 142104 (2005)]" @default.
- Q63381646 P1433 Q63381646-2F5F529D-17B7-4B3C-BE44-87CF6F29004A @default.
- Q63381646 P1476 Q63381646-B02A73D0-34E4-4409-B7DE-00AEE640BF09 @default.
- Q63381646 P2093 Q63381646-161C3533-1F29-4419-BFA5-D3861AD08714 @default.
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- Q63381646 P2093 Q63381646-58B5F401-45C8-4328-A452-F47DBA101E76 @default.
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- Q63381646 P304 Q63381646-4ED28084-22BA-4ECB-BE1F-9504918A2825 @default.
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- Q63381646 P356 1.2117612 @default.
- Q63381646 P1433 Q621615 @default.
- Q63381646 P1476 "Comment on “Radiative and nonradiative recombination process in InN films grown by metal organic chemical vapor deposition” [Appl. Phys. Lett. 86, 142104 (2005)]" @default.
- Q63381646 P2093 "L. J. Hu" @default.
- Q63381646 P2093 "R. Zhang" @default.
- Q63381646 P2093 "S. L. Gu" @default.
- Q63381646 P2093 "X. Q. Xiu" @default.
- Q63381646 P2093 "Y. D. Zheng" @default.
- Q63381646 P2093 "Y. H. Chen" @default.
- Q63381646 P2093 "Y. Shi" @default.
- Q63381646 P2093 "Z. G. Wang" @default.
- Q63381646 P2093 "Z. L. Xie" @default.
- Q63381646 P2093 "Z. X. Bi" @default.
- Q63381646 P304 "176101" @default.
- Q63381646 P31 Q13442814 @default.
- Q63381646 P356 "10.1063/1.2117612" @default.
- Q63381646 P433 "17" @default.
- Q63381646 P478 "87" @default.
- Q63381646 P50 Q58478487 @default.
- Q63381646 P577 "2005-10-24T00:00:00Z" @default.