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- Q63957719 description "article scientifique publié en 2003" @default.
- Q63957719 description "im April 2003 veröffentlichter wissenschaftlicher Artikel" @default.
- Q63957719 description "wetenschappelijk artikel" @default.
- Q63957719 description "наукова стаття, опублікована у квітні 2003" @default.
- Q63957719 name "Reactive Ion Etching of Cylindrical Polyferrocenylsilane Block Copolymer Micelles: Fabrication of Ceramic Nanolines on Semiconducting Substrates" @default.
- Q63957719 name "Reactive Ion Etching of Cylindrical Polyferrocenylsilane Block Copolymer Micelles: Fabrication of Ceramic Nanolines on Semiconducting Substrates" @default.
- Q63957719 type Item @default.
- Q63957719 label "Reactive Ion Etching of Cylindrical Polyferrocenylsilane Block Copolymer Micelles: Fabrication of Ceramic Nanolines on Semiconducting Substrates" @default.
- Q63957719 label "Reactive Ion Etching of Cylindrical Polyferrocenylsilane Block Copolymer Micelles: Fabrication of Ceramic Nanolines on Semiconducting Substrates" @default.
- Q63957719 prefLabel "Reactive Ion Etching of Cylindrical Polyferrocenylsilane Block Copolymer Micelles: Fabrication of Ceramic Nanolines on Semiconducting Substrates" @default.
- Q63957719 prefLabel "Reactive Ion Etching of Cylindrical Polyferrocenylsilane Block Copolymer Micelles: Fabrication of Ceramic Nanolines on Semiconducting Substrates" @default.
- Q63957719 P1433 Q63957719-C9D99E34-7A53-4A29-BB1C-694FCE67C2A0 @default.
- Q63957719 P1476 Q63957719-B3E57037-82CF-4CCE-A03C-6DCC06BF6C4A @default.
- Q63957719 P2093 Q63957719-235F6A96-5E0C-4C82-89CF-7B115C3439DC @default.
- Q63957719 P2093 Q63957719-276731A2-7CE4-46F7-8602-C1C98E571F97 @default.
- Q63957719 P2093 Q63957719-2CB0ABFC-9B98-45B6-9265-E642BE9AD7EC @default.
- Q63957719 P2093 Q63957719-418214BD-2236-4ADE-8B53-68A64AEA7C03 @default.
- Q63957719 P2093 Q63957719-8C49DE08-A8AF-4226-8DFA-AC96FC114A69 @default.
- Q63957719 P2093 Q63957719-BD4B9CB5-54EE-41E5-8612-DFCE89BCD8AB @default.
- Q63957719 P2093 Q63957719-FCEC755A-8C6E-4979-8730-56100337C466 @default.
- Q63957719 P304 Q63957719-DF34A6C3-A636-4267-A850-5B4351F712C7 @default.
- Q63957719 P31 Q63957719-63A41775-F335-4E65-8548-B65C2B5B5D24 @default.
- Q63957719 P356 Q63957719-11C09FDE-5999-4D6E-9A94-7B8E8E1A0154 @default.
- Q63957719 P433 Q63957719-66663260-CD55-471E-87D2-60CCE0F31C6D @default.
- Q63957719 P478 Q63957719-AEE67F03-DC37-40C4-9A18-2BF5BABDB20E @default.
- Q63957719 P50 Q63957719-D6894FD2-2E20-4964-825B-8B3571EBDC61 @default.
- Q63957719 P577 Q63957719-7C912431-CB49-4DA4-B0E4-C9D043E30CC1 @default.
- Q63957719 P356 ADFM.200304261 @default.
- Q63957719 P1433 Q2126905 @default.
- Q63957719 P1476 "Reactive Ion Etching of Cylindrical Polyferrocenylsilane Block Copolymer Micelles: Fabrication of Ceramic Nanolines on Semiconducting Substrates" @default.
- Q63957719 P2093 "I. Manners" @default.
- Q63957719 P2093 "J.A. Massey" @default.
- Q63957719 P2093 "J.P. Spatz" @default.
- Q63957719 P2093 "L. Cao" @default.
- Q63957719 P2093 "M. Möller" @default.
- Q63957719 P2093 "M.A. Winnik" @default.
- Q63957719 P2093 "S. Riethmüller" @default.
- Q63957719 P304 "271-276" @default.
- Q63957719 P31 Q13442814 @default.
- Q63957719 P356 "10.1002/ADFM.200304261" @default.
- Q63957719 P433 "4" @default.
- Q63957719 P478 "13" @default.
- Q63957719 P50 Q47888217 @default.
- Q63957719 P577 "2003-04-17T00:00:00Z" @default.