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- Q74317776 description "article scientifique publié en 1998" @default.
- Q74317776 description "articolo scientifico (pubblicato il 1998)" @default.
- Q74317776 description "artikull shkencor i botuar më 01 janar 1998" @default.
- Q74317776 description "artículu científicu espublizáu en xineru de 1998" @default.
- Q74317776 description "im Januar 1998 veröffentlichter wissenschaftlicher Artikel" @default.
- Q74317776 description "scientific article published on 01 January 1998" @default.
- Q74317776 description "wetenschappelijk artikel" @default.
- Q74317776 description "наукова стаття, опублікована в січні 1998" @default.
- Q74317776 name "High resolution electron microscopy of amorphous interlayers between metal thin films and silicon" @default.
- Q74317776 name "High resolution electron microscopy of amorphous interlayers between metal thin films and silicon" @default.
- Q74317776 name "High resolution electron microscopy of amorphous interlayers between metal thin films and silicon" @default.
- Q74317776 type Item @default.
- Q74317776 label "High resolution electron microscopy of amorphous interlayers between metal thin films and silicon" @default.
- Q74317776 label "High resolution electron microscopy of amorphous interlayers between metal thin films and silicon" @default.
- Q74317776 label "High resolution electron microscopy of amorphous interlayers between metal thin films and silicon" @default.
- Q74317776 prefLabel "High resolution electron microscopy of amorphous interlayers between metal thin films and silicon" @default.
- Q74317776 prefLabel "High resolution electron microscopy of amorphous interlayers between metal thin films and silicon" @default.
- Q74317776 prefLabel "High resolution electron microscopy of amorphous interlayers between metal thin films and silicon" @default.
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- Q74317776 P356 (SICI)1097-0029(19980115)40:2%3C136::AID-JEMT5%3E3.0.CO;2-T @default.
- Q74317776 P698 9504125 @default.
- Q74317776 P1433 Q59757 @default.
- Q74317776 P1476 "High resolution electron microscopy of amorphous interlayers between metal thin films and silicon" @default.
- Q74317776 P2093 "Chen LJ" @default.
- Q74317776 P2093 "Hsieh WY" @default.
- Q74317776 P2093 "Lee TL" @default.
- Q74317776 P2093 "Liang JM" @default.
- Q74317776 P2093 "Lin JH" @default.
- Q74317776 P2093 "Luo CH" @default.
- Q74317776 P2093 "Wang MH" @default.
- Q74317776 P304 "136-151" @default.
- Q74317776 P31 Q13442814 @default.
- Q74317776 P356 "10.1002/(SICI)1097-0029(19980115)40:2<136::AID-JEMT5>3.0.CO;2-T" @default.
- Q74317776 P433 "2" @default.
- Q74317776 P478 "40" @default.
- Q74317776 P577 "1998-01-01T00:00:00Z" @default.
- Q74317776 P698 "9504125" @default.
- Q74317776 P921 Q1137203 @default.