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- Q84891473 description "artículu científicu espublizáu n'avientu de 2009" @default.
- Q84891473 description "scientific article published on 01 December 2009" @default.
- Q84891473 description "wetenschappelijk artikel" @default.
- Q84891473 description "наукова стаття, опублікована в грудні 2009" @default.
- Q84891473 description "գիտական հոդված հրատարակված 2009 թվականի դեկտեմբերի 1-ին" @default.
- Q84891473 name "Low damage atomic layer etching of ZrO2 by using BCl3 gas and ar neutral beam" @default.
- Q84891473 name "Low damage atomic layer etching of ZrO2 by using BCl3 gas and ar neutral beam" @default.
- Q84891473 type Item @default.
- Q84891473 label "Low damage atomic layer etching of ZrO2 by using BCl3 gas and ar neutral beam" @default.
- Q84891473 label "Low damage atomic layer etching of ZrO2 by using BCl3 gas and ar neutral beam" @default.
- Q84891473 prefLabel "Low damage atomic layer etching of ZrO2 by using BCl3 gas and ar neutral beam" @default.
- Q84891473 prefLabel "Low damage atomic layer etching of ZrO2 by using BCl3 gas and ar neutral beam" @default.
- Q84891473 P1433 Q84891473-EBC8202A-C2E4-4BEE-B2D8-5AF16B3C3576 @default.
- Q84891473 P1476 Q84891473-05E58C59-1F8F-4E10-B751-83D9BCB2758F @default.
- Q84891473 P2093 Q84891473-023C81FA-19CF-422B-82C8-680929B07286 @default.
- Q84891473 P2093 Q84891473-0B93B59C-5343-4A45-84D5-EECDFE770B41 @default.
- Q84891473 P2093 Q84891473-22454D54-8E4F-4BC9-B7E9-9D452E6BD8D1 @default.
- Q84891473 P2093 Q84891473-367FB019-42B6-40CE-8544-D3A34ED36456 @default.
- Q84891473 P2093 Q84891473-BC2D559F-C5F7-4568-87CB-045D5D154585 @default.
- Q84891473 P304 Q84891473-7B1747B7-31FC-4B21-B331-AA5F85B80618 @default.
- Q84891473 P31 Q84891473-B179FC89-271E-4A3C-A6AD-FB653BEEBB89 @default.
- Q84891473 P356 Q84891473-B177FD92-8AC7-4B6B-96A9-E405D8D38148 @default.
- Q84891473 P407 Q84891473-E616F05D-61A3-45DB-9DE0-11789A39E0E2 @default.
- Q84891473 P433 Q84891473-6D88E289-D2EE-4CA9-9D88-9DCA0B118E6D @default.
- Q84891473 P478 Q84891473-BDD2B0C4-416F-42D9-86B7-6AA732D9EA1D @default.
- Q84891473 P577 Q84891473-7AA2A4D5-F1E5-4AD0-86A3-842478452B3E @default.
- Q84891473 P698 Q84891473-615F3600-4CA2-459A-B4CA-01386A2CC3B6 @default.
- Q84891473 P356 JNN.2009.1748 @default.
- Q84891473 P698 19908792 @default.
- Q84891473 P1433 Q2364336 @default.
- Q84891473 P1476 "Low damage atomic layer etching of ZrO2 by using BCl3 gas and ar neutral beam" @default.
- Q84891473 P2093 "B J Park" @default.
- Q84891473 P2093 "G Y Yeom" @default.
- Q84891473 P2093 "J B Park" @default.
- Q84891473 P2093 "J Y Park" @default.
- Q84891473 P2093 "W S Lim" @default.
- Q84891473 P304 "7379-7382" @default.
- Q84891473 P31 Q13442814 @default.
- Q84891473 P356 "10.1166/JNN.2009.1748" @default.
- Q84891473 P407 Q1860 @default.
- Q84891473 P433 "12" @default.
- Q84891473 P478 "9" @default.
- Q84891473 P577 "2009-12-01T00:00:00Z" @default.
- Q84891473 P698 "19908792" @default.