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- Q85218000 description "article scientifique publié en 2010" @default.
- Q85218000 description "artículu científicu espublizáu n'ochobre de 2010" @default.
- Q85218000 description "im Oktober 2010 veröffentlichter wissenschaftlicher Artikel" @default.
- Q85218000 description "scientific article published on 19 October 2010" @default.
- Q85218000 description "wetenschappelijk artikel" @default.
- Q85218000 description "наукова стаття, опублікована в жовтні 2010" @default.
- Q85218000 name "Resist free patterning of nonpreferential buffer layers for block copolymer lithography" @default.
- Q85218000 name "Resist free patterning of nonpreferential buffer layers for block copolymer lithography" @default.
- Q85218000 type Item @default.
- Q85218000 label "Resist free patterning of nonpreferential buffer layers for block copolymer lithography" @default.
- Q85218000 label "Resist free patterning of nonpreferential buffer layers for block copolymer lithography" @default.
- Q85218000 prefLabel "Resist free patterning of nonpreferential buffer layers for block copolymer lithography" @default.
- Q85218000 prefLabel "Resist free patterning of nonpreferential buffer layers for block copolymer lithography" @default.
- Q85218000 P1433 Q85218000-333A6DE7-F21E-499D-A2AA-57F1473E8764 @default.
- Q85218000 P1476 Q85218000-3F47DFB1-C05C-42C7-933B-1C6355C5508A @default.
- Q85218000 P2093 Q85218000-154ACB42-1EB9-4A25-985D-0B603E1DBB3B @default.
- Q85218000 P2093 Q85218000-57FFDC66-2D05-4190-A35D-0EEEF748D291 @default.
- Q85218000 P2093 Q85218000-76904A3E-7828-4593-9E2D-62BBAAB485C7 @default.
- Q85218000 P2093 Q85218000-7C78250B-E625-4ABC-BAB3-5B335A3F7A27 @default.
- Q85218000 P304 Q85218000-8E5DC3C8-F0CF-407A-8298-BE4AC2A277EB @default.
- Q85218000 P31 Q85218000-7E32BD24-6A5A-4972-BEBC-7271154D7B2D @default.
- Q85218000 P356 Q85218000-596BE78F-52FD-496A-9224-F4E41EAD1A9B @default.
- Q85218000 P433 Q85218000-D7DED361-A857-43C1-BB91-ABA9A5E39853 @default.
- Q85218000 P478 Q85218000-2B4A9CF2-9AB1-4372-8C42-3FDC1AC02F13 @default.
- Q85218000 P577 Q85218000-AF706E9C-346A-43D1-954B-96E1851380E1 @default.
- Q85218000 P698 Q85218000-29D3EEC4-B655-479E-94EA-CCCEA43D91D4 @default.
- Q85218000 P356 NN101616D @default.
- Q85218000 P698 20958012 @default.
- Q85218000 P1433 Q2819067 @default.
- Q85218000 P1476 "Resist free patterning of nonpreferential buffer layers for block copolymer lithography" @default.
- Q85218000 P2093 "Eungnak Han" @default.
- Q85218000 P2093 "Melvina Leolukman" @default.
- Q85218000 P2093 "Myungwoong Kim" @default.
- Q85218000 P2093 "Padma Gopalan" @default.
- Q85218000 P304 "6527-6534" @default.
- Q85218000 P31 Q13442814 @default.
- Q85218000 P356 "10.1021/NN101616D" @default.
- Q85218000 P433 "11" @default.
- Q85218000 P478 "4" @default.
- Q85218000 P577 "2010-10-19T00:00:00Z" @default.
- Q85218000 P698 "20958012" @default.