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- W102446411 abstract "Progress in an on-going effort to fabricate improved laser mirrors from reactively sputtered amorphous oxides (Nb, Ta, Ti, Si), nitrides (Si), and semiconductor alloys (Si:H) is reported. Optimum coating materials have been selected for use at 1315 nm. Materials for shorter wavelengths are also suggested. Supporting data include laser calorimetric absorption coefficients, surface roughnesses deduced from total integrated scattering, refractive indices, and residual mechanical stress levels. An automated reactive gas exchange technique is described for mirror fabrication. Laser calorimetry, total integrated scattering and environmental stability results are presented for fabricated mirrors. Reflectances greater than 0.999 have been achieved." @default.
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- W102446411 date "1984-10-01" @default.
- W102446411 modified "2023-09-27" @default.
- W102446411 title "1315 nm dielectric mirror fabrication by reactive sputtering" @default.
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