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- W103129922 abstract "Sol-gel film coatings are considered as candidate abrasion resistant and anti-reflection coatings for photovoltaic concentrator solar cells. The studies described in this report concern the electrical breakdown potential as a function of processing in ammonia. It has previously been determined that large (5-40 atomic percent) amounts of nitrogen can be incorporated into silica sol-gels by ammonia exposure during the densification process to form an oxynitride. Most of the expected behavior of the nitrided sol/gel deposits were masked due to the presence of alkali impurities and interfacial defects. The dielectric strength of such films was no greater than silicon oxide films thermally grown. The distribution of breakdown potential was much narrower, however, for nitrided films. For the expected improved properties of nitrided sol gel films to be seen, more care with the purity of the deposition materials and atmosphere will need to be exercised." @default.
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- W103129922 date "1986-03-01" @default.
- W103129922 modified "2023-09-27" @default.
- W103129922 title "Dielectric properties of silicon dioxide and silicon-oxynitride sol/gel thin films" @default.
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