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- W104253503 endingPage "216" @default.
- W104253503 startingPage "133" @default.
- W104253503 abstract "Electrophoretic deposition (EPD) is a special colloidal processing technique that uses the electrophoresis mechanism for the movement of charged particles suspended in a solution under an electric field and to deposit them in an ordered manner on a substrate to develop thin and thick films, coatings, and free-standing bodies. EPD emerges as a method of choice due to formation of uniform thin or multilayer films of controlled thickness and morphology, even on substrates of complex shape [1–13]. The thickness and structure of deposited films can be easily controlled by changing the deposition parameters, i.e., applied voltage, deposition time, and particles concentration in suspension, while mechanical characteristics are good [14]. The interest in EPD is based not only on its high versatility to be used with different materials but also because EPD is a cost-effective technique usually requiring simple processing equipment and infrastructure [1]. Electrophoretic deposition is gaining increasing attention both in science and industry, due to novel applications in the processing of advanced ceramic materials." @default.
- W104253503 created "2016-06-24" @default.
- W104253503 creator A5009303929 @default.
- W104253503 date "2014-01-01" @default.
- W104253503 modified "2023-09-29" @default.
- W104253503 title "Electrophoretic Deposition of Ceramic Coatings on Metal Surfaces" @default.
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