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- W1055864277 abstract "Microfabrication techniques, derived from the semiconductor industry, can be used to make a variety of useful mechanical components for targets. A selection of target components fabricated using deep-etched materials including supporting cooling arms for prototype cryogenic inertial confinement fusion targets, and stepped and graded density targets for materials dynamics experiments is described. Microfabrication enables cost-effective, simultaneous fabrication of multiple high-precision components with complex geometries." @default.
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- W1055864277 date "2009-04-01" @default.
- W1055864277 modified "2023-10-14" @default.
- W1055864277 title "Microfabricated Deep-Etched Structures for ICF and Equation-of-State Targets" @default.
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- W1055864277 doi "https://doi.org/10.13182/fst09-3448" @default.
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