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- W130142587 abstract "SiO 2 layers (90-300nm) of natural isotopic composition, obtained by anodic or thermal oxidation were treated in 180 enriched water vapor at 13 Torr for 1-3 h at 600 or 930°C; 16 O and 18 O contents were determined by nuclear microanalysis; 18 O profiling was carried out using the 629 keV narrow resonance in the nuclear reaction 18 O (p, α) 15 N. Oxygen exchange appears to be the main process even at 930°C. Its kinetics is a function of the type of oxide (anodic or thermal) and increases with temperature. 18 O profiles vary drastically with temperature. As a matter of fact, at 930°C it appears that the phenomenon is controled by bulk-diffusion; in contrast, at 600°C the rate of exchange between network oxygen atoms and mobile species is not infinite any longer and the phenomenon cannot be described by a “common” bulk-diffusion process." @default.
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- W130142587 date "1980-01-01" @default.
- W130142587 modified "2023-10-01" @default.
- W130142587 title "AN 18O STUDY OF THE OXYGEN EXCHANGE IN SILICON OXIDE FILMS DURING THERMAL TREATMENT IN WATER VAPOR" @default.
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- W130142587 doi "https://doi.org/10.1016/b978-0-08-025969-7.50036-1" @default.
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