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- W132601671 abstract "In situ ellipsometric characterizations of Si1−xGex alloys are presented. The samples are grown by chemical beam epitaxy using silane and germane. The growth process (kinetics, composition etc.) is in situ controlled using a rotating-polarizer multiwavelength ellipsometer. Several examples of heteroepitaxy followed by ellipsometry are shown: desorption of the native oxide and the initial growth stages are analysed at different photon energies. The sequential heteroepitaxy of Si0.85Ge0.15 on Si and Si on Si0.85Ge0.15 is investigated." @default.
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- W132601671 date "1994-08-01" @default.
- W132601671 modified "2023-09-26" @default.
- W132601671 title "In situ ellipsometric control of heterostructures grown by chemical beam epitaxy" @default.
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- W132601671 doi "https://doi.org/10.1016/0040-6090(94)90201-1" @default.
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