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• W133930637 abstract "A high current ion implanter, which completely eliminates energy contaminations, was developed. Since a deflecting magnet, functioning as an energy filter, was additionally placed between the post-acceleration electrodes and target, the beam width on the target became changeable, depending on post-acceleration voltages when a conventional post-acceleration system is used. Consequently, a new post-acceleration system was developed to keep the beam width constant. This implanter also eliminates molybdenum contamination in BF 2 + implantation, which is sometimes a serious problem, by adopting a molybdenum-free microwave ion source." @default.
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• W133930637 date "1993-01-01" @default.
• W133930637 modified "2023-09-26" @default.
• W133930637 title "Post-Acceleration System for a Clean Ion Implanter" @default.
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• W133930637 doi "https://doi.org/10.1016/b978-0-444-89994-1.50097-1" @default.
• W133930637 hasPublicationYear "1993" @default.
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