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- W144417405 abstract "ABSTRACT Luminescence induced by 100-3000V electron beams (cathodoluminescence) has been studied in thermally grown SiO 2 films and bulk silica. In addition to the commonly observed emission lines at 1.9, 2.7, and 4.4 eV, an additional broad emission was observed in the vacuum ultraviolet. This band is centered at 6.6 eV with a width of approximately 2 eV and a high-energy tail which extends to 10 eV. In contrast to the 4.4 and 2.7 eV lines which fatigue and decrease in intensity on cooling to 80 K, the 6.6 eV line appears insensitive to temperature. Studies of the dependence of luminescence on electron-beam penetration depth indicate a region of about 150 A at the film-vacuum interface where the 2.7 and 4.4 eV luminescence is strongly inhibited. This effect may indicate the presence of a “dead layer” with a decreased density of luminescence centers near the film surface. The 6.6 eV line does not appear to have a comparable dead layer." @default.
- W144417405 created "2016-06-24" @default.
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- W144417405 date "1980-01-01" @default.
- W144417405 modified "2023-09-27" @default.
- W144417405 title "ELECTRON-BEAM-INDUCED LUMINESCENCE IN SiO2" @default.
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- W144417405 doi "https://doi.org/10.1016/b978-0-08-025969-7.50030-0" @default.
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