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- W1480139728 abstract "Summary form only given, as follows. In order to improve the discharge luminous efficiency for AC-PDP, the emission characteristics of VUV rays from xenon is important for color AC-PDPs. The influence of Ne-Xe gas-mixture ratio on resonance state Xe*(3p/sub 1/) and exited state Xe* (3p/sub 2/) has been investigated. At first, we observed xenon 823 and 828 nm infrared light which relates to VUV 173 nm and 147 nm emission, respectively, and we measured the 147 nm from Xe(3p/sub 1/) resonance emission and the 173 nm from molecular dimer Xe/sub 2/*(3p/sub 2/) for Ne-Xe mixture gas using an vacuum monochromator. It is found that the intensity of VUV 147 nm emission is proportional to that of the IR 828 nm emission, and the VUV 173 nm emission is roughly proportional to that of the IR 823 nm emission. It is noted that for high Xe gas mixture ratio greater than 7% the increase of the luminous efficiency is found to be saturate. This saturation characteristic with increasing Xe gas mixture ratio associates with the plasma saturation. For increasing Xe gas mixture the ratio of molecular dimer emission to resonance emission increases, due to the increasing emission probability for molecular dimmer formation in three-body collision. The electron temperature and plasma density have been experimentally measured from the center of sustaining electrode gap by a micro Langmuir probe and high-speed ICCD camera methods in AC-PDPs. The plasma density from the center of sustaining electrode gap is shown to be maximum value of 9/spl times/10/sup 11/ cm/sup -3/, while the electron temperature is about 1 eV in this experiment." @default.
- W1480139728 created "2016-06-24" @default.
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- W1480139728 date "2003-06-25" @default.
- W1480139728 modified "2023-09-22" @default.
- W1480139728 title "Influence of Ne-Xe gas mixture ratio on vacuum ultraviolet and infrared line in AC-PDPs" @default.
- W1480139728 doi "https://doi.org/10.1109/plasma.2002.1030254" @default.
- W1480139728 hasPublicationYear "2003" @default.
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