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• W1480525057 abstract "This work reports on the fabrication of two- (2D) and three-dimensional (3D) microstructures starting from the macropore formation by electrochemical etching of n-type silicon. We describe some critical effects of the etching process that act as sources of degeneration to the otherwise perfect pore pattern. We also give the solutions to improve the pore uniformity and produce high-aspect-ratio macropores with good structural characteristics. The obtained macroporous structures can be further processed to produce high-aspect-ratio pillars, instead of pores. Besides, by modulating the etching current we have also induced periodicity in the third dimension. Possible applications of the presented structures are discussed." @default.
• W1480525057 created "2016-06-24" @default.
• W1480525057 creator A5002673924 @default.
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• W1480525057 date "2005-09-09" @default.
• W1480525057 modified "2023-10-17" @default.
• W1480525057 title "Two- and three-dimensional microstructures produced by electrochemical etching of silicon" @default.
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• W1480525057 doi "https://doi.org/10.1109/sced.2005.1504365" @default.
• W1480525057 hasPublicationYear "2005" @default.
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