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- W1485573188 abstract "This paper briefly reviews the process of UV laser induced thin film deposition, with emphasis on microelectronic applications. The unique aspects of this technique include low process temperatures and spatially selective deposits. Both large area and localized depositions are examined." @default.
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- W1485573188 date "1987-01-01" @default.
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- W1485573188 title "UV laser induced thin film deposition" @default.
- W1485573188 doi "https://doi.org/10.1063/1.36826" @default.
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