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• W1487331379 abstract "Surface roughness of polycrystalline Ag thin films frequently used in plasmonic applications can be considerably reduced with a Ge wetting interlayer, that inhibits island growth due to large Ag-Ge adhesion. However, segregation of Ge to the Ag free surface and grain boundaries leads to an increase of the specific resistivity and of the imaginary part of Ag permittivity in the 500 – 800 nm spectral range. Here we demonstrate that this increase in losses is due to localized plasmon resonances on silver grain boundaries. The investigated samples are deposited on SiO 2 substrates using e-beam physical vapour deposition. The samples are characterized using atomic force microscopy (AFM), scanning electron microscopy (SEM), spectroscopic ellipsometry (SE), X-ray diffraction (XRD), X-ray reflection (XRR) and X-ray photoelectron spectroscopy (XPS)." @default.
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• W1487331379 date "2015-07-01" @default.
• W1487331379 modified "2023-10-01" @default.
• W1487331379 title "Localized plasmon resonances on grains in smooth Ag films" @default.
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• W1487331379 doi "https://doi.org/10.1109/icton.2015.7193633" @default.
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