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- W1489774933 abstract "Summary form only given. The investigations concern Al/sub 2/O/sub 3/ layers produced by the reactive pulse plasma (RPP) method on semiconductor substrates (Si, SiC). The layers have been investigated both in terms of structure and electrophysical properties. We have developed a technology for producing MIS transistors with these layers as dielectrics, and the electrical parameters of the transistors have been defined." @default.
- W1489774933 created "2016-06-24" @default.
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- W1489774933 date "2002-11-13" @default.
- W1489774933 modified "2023-09-23" @default.
- W1489774933 title "Al/sub 2/O/sub 3/ layers for microelectronic applications" @default.
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- W1489774933 doi "https://doi.org/10.1109/wbl.2001.946602" @default.
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