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• W1492379706 abstract "We have grown high quality Si epilayers on wurtzite gallium nitride substrate by low-pressure chemical vapor deposition. X-ray photoelectron spectra and Auger electron spectra were employed to analyze the components and chemical structures of Si/GaN. The results indicated that there was nitrogen diffusion from the GaN layer to the Si layer and substitutional N accumulation near the interface, which agreed with carrier concentration obtained from electrical conductivity measurements." @default.
• W1492379706 created "2016-06-24" @default.
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• W1492379706 date "2005-08-25" @default.
• W1492379706 modified "2023-09-25" @default.
• W1492379706 title "Structural study of chemical vapor deposition of Si on GaN" @default.
• W1492379706 cites W2092395060 @default.
• W1492379706 doi "https://doi.org/10.1109/icsict.2001.982118" @default.
• W1492379706 hasPublicationYear "2005" @default.
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