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- W1493120482 abstract "For MOS capacitors with Ta/sub 2/O/sub 5/ gate insulator, the voltage needed to maintain constant injection current is found to decrease gradually in an initial stage longer then the usual positive charge-trapping phase. The above observation can be explained by the gradual destruction of an intermediate layer of SiO/sub 2/ between the Ta/sub 2/O/sub 5/ film and the substrate. Annealing in oxygen makes this voltage decrease more pronounced, must probably because of the additional growth of the oxide layer during anneal." @default.
- W1493120482 created "2016-06-24" @default.
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- W1493120482 date "2002-11-07" @default.
- W1493120482 modified "2023-09-25" @default.
- W1493120482 title "Stress induced degradation in RF deposited Ta/sub 2/O/sub 5/ films on silicon" @default.
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- W1493120482 doi "https://doi.org/10.1109/icmel.2000.840593" @default.
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