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- W1495537912 abstract "In conclusion, we demonstrated the fabrication and I–V characteristics of HfS 2 FETs. For the channel thickness of less than 7.5 nm, a clear saturation behavior and drain current of 0.2 µA/µm were observed with reasonably good on/off current ratio. These results provide basic knowledge of HfS 2 as a channel material for FET." @default.
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- W1495537912 date "2015-06-01" @default.
- W1495537912 modified "2023-09-23" @default.
- W1495537912 title "Fabrication of thin-film HfS<inf>2</inf> FET" @default.
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- W1495537912 doi "https://doi.org/10.1109/drc.2015.7175643" @default.
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