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- W1496718578 abstract "Ru‐implanted titanium near‐surface alloys were generated by ion implantation, characterized (Ru concentration/ depth profiles) by Rutherford backscattering, and subsequently anodically oxidized to form electrocatalytically active electrodes. The electrochemical behavior of the metallic‐like electrodes was investigated in acidic chloride, perchlorate, and sulfate media. A correlation between the rate of the evolution reaction and the Ru‐implant profiles established that the reaction is first order in the concentration of Ru(IV) in the oxide at the oxide/solution interface, and enabled an in situ evaluation of the latter quantity. The Tafel slope for the evolution reaction is 40 mV, i.e., . The reaction order with respect to chloride ion concentration, , approaches 1.0 and 2.0 at high and low chloride concentrations, respectively. A modified Volmer‐Heyrovsky mechanism, one in which the role of adsorbed chloride ions is taken into account, is shown to be consistent with the aforementioned diagnostic parameters." @default.
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- W1496718578 date "1987-07-01" @default.
- W1496718578 modified "2023-09-27" @default.
- W1496718578 title "Application of Ion Implantation to the Study of Electrocatalysis: I . Chlorine Evolution at Ru‐Implanted Titanium Electrodes" @default.
- W1496718578 doi "https://doi.org/10.1149/1.2100733" @default.
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