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- W1498982282 abstract "Amorphous Sil-xGex films (x=O, 0.25, 0.5,0.75 and 1, having Boron concentrations of 5.1018, 5.1019 and 5-1$Ocm-3), were deposited at low temperature by a molecular beam processing on SiO2/Si(001) substrates. Samples were studied by in-situ TEM and in-situ XRD to follow the crystallization process. In addition, transport properties were studied in samples which were annealed in vacuum by a hot-wall furnace at temperatures between 500 to 90O0C for 1 hour. The microstructure of B-doped SiGe films is characterized by a relatively large grain size (about lpm). The si0.5Gf!Q5 films have a rather high and temperature independent Hdl mobility (25 to 60 cm2Nsec), Seebeck coefficient (-150 to 250 pV/K at m m temperature) and conductivity ((200 to 2000 (Ohm.cm)-l at m m temperature). Therefore, the highly-doped pc-SiGe films that we produce in the present research project show transport characteristics comparable to the sintered SiGe materials for thermoelectric applications." @default.
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- W1498982282 date "2002-11-23" @default.
- W1498982282 modified "2023-09-26" @default.
- W1498982282 title "Structure and transport properties of microcrystalline SiGe films" @default.
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- W1498982282 doi "https://doi.org/10.1109/ict.1997.667091" @default.
- W1498982282 hasPublicationYear "2002" @default.
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