Matches in SemOpenAlex for { <https://semopenalex.org/work/W1501331060> ?p ?o ?g. }
- W1501331060 abstract "Atomic layer deposition (ALD) is an advanced technique for growing thin film structures. ALD was developed by Tuomo Suntola and co workers in 1974. At first, the method was called Atomic layer epitaxy (ALE). However, today the name “ALD” is more common. The motiva‐ tion behind developing ALD was the desire to achieve a technique for creating thin film electroluminescent (TFEL) flat panel displays. [1][7]" @default.
- W1501331060 created "2016-06-24" @default.
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- W1501331060 date "2013-06-10" @default.
- W1501331060 modified "2023-09-27" @default.
- W1501331060 title "Atomic Layer Deposition on Self-Assembled-Monolayers" @default.
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- W1501331060 doi "https://doi.org/10.5772/54814" @default.
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