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• W1502569746 abstract "Abstract The article contains sections titled: 1. Secondary Ion Mass Spectrometry 1.1. Static Secondary Ion Mass Spectrometry (SSIMS) 1.1.1. Principles 1.1.2. Instrumentation 1.1.2.1. Ion Sources 1.1.2.2. Mass Analyzers 1.1.3. Quantification 1.1.4. Spectral Information 1.1.5. Applications 1.1.5.1. Oxide Films 1.1.5.2. Interfaces 1.1.5.3. Polymers 1.1.5.4. Biosensors 1.1.5.5. Surface Reactions 1.1.5.6. Imaging 1.1.5.7. Ultrashallow Depth Profiling 1.2. Dynamic SIMS 1.2.1. Principles 1.2.2. Instrumentation 1.2.2.1. Ion Sources 1.2.2.2. Mass Analyzers 1.2.2.3. Detectors 1.2.3. Spectral Information 1.2.4. Quantification 1.2.5. Mass Spectra 1.2.6. Depth Profiles 1.2.7. Imaging 1.2.8. Applications 1.2.8.1. Implantation Profiles 1.2.8.2. Layer Analysis 1.2.8.3. 3D Bulk Element Distribution 2. Secondary Neutral Mass Spectrometry (SNMS) 2.1. General Principles 2.2. Electron‐Beam and HF‐Plasma SNMS 2.2.1. Principles 2.2.2. Instrumentation 2.2.3. Spectral Information 2.2.4. Quantification 2.2.5. Element Depth Profiling 2.2.6. Applications 2.3. Laser‐SNMS 2.3.1. Principles 2.3.1.1. Nonresonant Laser‐SNMS 2.3.1.2. Resonant Laser‐SNMS 2.3.1.3. Experimental Setup 2.3.1.4. Ionization Schemes 2.3.2. Instrumentation 2.3.3. Spectral Information 2.3.4. Quantification 2.3.5. Applications 2.3.5.1. Nonresonant Laser‐SNMS 2.3.5.2. Resonant Laser‐SNMS 3. Ion‐Scattering Techniques 3.1. Rutherford Backscattering Spectroscopy (RBS) 3.1.1. Principles 3.1.2. Instrumentation 3.1.3. Spectral Information 3.1.4. Quantification 3.1.5. Applications 3.2. Low‐Energy Ion Scattering (LEIS) 3.2.1. Principles 3.2.2. Instrumentation 3.2.3. Information 3.2.4. Quantification 3.2.5. Applications 4. Other Ion‐Detecting Techniques 4.1. Desorption Methods 4.1.1. Electron‐Stimulated Desorption (ESD) and Electron‐Stimulated Desorption Ion Angular Distribution (ESDIAD) 4.1.2. Thermal Desorption Spectroscopy (TDS) 4.2. Glow Discharge Mass Spectroscopy (GDMS) 4.3. Fast Atom Bombardment Mass Spectroscopy (FABMS) 4.4. Atom Probe Microscopy 4.4.1. Atom Probe Field‐Ion Microscopy (APFIM) 4.4.2. Position‐Sensitive Atom Probe (POSAP)" @default.
• W1502569746 created "2016-06-24" @default.
• W1502569746 creator A5007570263 @default.
• W1502569746 creator A5013084256 @default.
• W1502569746 creator A5020395158 @default.
• W1502569746 creator A5023109478 @default.
• W1502569746 creator A5030412560 @default.
• W1502569746 creator A5030729499 @default.
• W1502569746 creator A5030744457 @default.
• W1502569746 creator A5042546280 @default.
• W1502569746 creator A5043207855 @default.
• W1502569746 date "2011-10-15" @default.
• W1502569746 modified "2023-10-17" @default.
• W1502569746 title "Surface and Thin-Film Analysis, 3. Ion Detection" @default.
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