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- W1505040203 abstract "Oxidization of a dilute Si(Ge) alloy is modeled using an original protocol based on molecular dynamics simulation and rules for the oxygen insertions. These rules, deduced from ab-initio calculations, favor the formation of SiO_2 against GeO_2 oxide which leads to segregation of Ge atoms into the alloy during the oxidization front advance. Ge condensation is then observed close to the SiO_2/Ge interface due to the strain induced by oxydization in this region. From the analysis of the simulation process, we propose a one-dimensional description of Ge condensation wich perfectly reproduces the evolution of the Ge concentration during oxidization of the SiGe alloy." @default.
- W1505040203 created "2016-06-24" @default.
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- W1505040203 date "2012-07-31" @default.
- W1505040203 modified "2023-10-17" @default.
- W1505040203 title "Ge condensation under SiGe oxidization: from Molecular Dynamics simulation to one-dimensional analytic modeling" @default.
- W1505040203 hasPublicationYear "2012" @default.
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