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• W1506093616 endingPage "062004" @default.
• W1506093616 startingPage "062004" @default.
• W1506093616 abstract "A plasmonic lithography method is proposed to generate a large-area, period-reduced, subwavelength one-dimensional grating pattern. It is demonstrated with a surface plasmon polaritons interference effect and a hyperbolic metamaterial multilayer structure by UV radiation at 405 nm wavelength. Photoresist patterns of 1.5 × 1.5 cm2 area with 350 nm period and 100 nm linewidth were fabricated on polyethylene terephthalate films by using a 700-nm-period Al grating mask and exposed to a transverse magnetic polarized laser. The proposed lithography approach provides a cost-effective and less laborious pathway for the fabrication of large-area periodic nano-patterns." @default.
• W1506093616 created "2016-06-24" @default.
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• W1506093616 date "2015-05-28" @default.
• W1506093616 modified "2023-09-27" @default.
• W1506093616 title "Period reduction lithography in normal UV range with surface plasmon polaritons interference and hyperbolic metamaterial multilayer structure" @default.
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• W1506093616 doi "https://doi.org/10.7567/apex.8.062004" @default.
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