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• W1506502249 abstract "This chapter contains sections titled: The Scaling and Improved Performance of MOSFET Devices Urgent Issues about MOS Gate Materials for Sub-0.1 µm Device Gate Stack New Requirements of MOS Gate Materials for Sub-0.1 µm Device Gate Stack Summary References" @default.
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• W1506502249 date "2012-08-22" @default.
• W1506502249 modified "2023-10-16" @default.
• W1506502249 title "Metal Gate Electrode for Advanced CMOS Application" @default.
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• W1506502249 doi "https://doi.org/10.1002/9783527646340.ch11" @default.
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